Deposition of SiO2 in integrated distributed electron...

Thin Solid Films 1997 Vol. 296; Iss. 1-2

Deposition of SiO2 in integrated distributed electron cyclotron resonance microwave reactor

Pavel Bulkin, Nicolas Bertrand, Bernard Drevillon
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
296
Year:
1997
Language:
english
Pages:
3
DOI:
10.1016/s0040-6090(96)09380-7
File:
PDF, 272 KB
english, 1997
Conversion to is in progress
Conversion to is failed