In situ reflection high energy electron bombardment...

In situ reflection high energy electron bombardment analysis of biaxially oriented yttria-stabilized zirconia thin film growth on amorphous substrates

V Betz, B Holzapfel, L Schultz
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Volume:
301
Year:
1997
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(96)09543-0
File:
PDF, 253 KB
english, 1997
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