Si-containing crystalline carbon nitride derived from microwave plasma-enhanced chemical vapor deposition
L.C. Chen, D.M. Bhusari, C.Y. Yang, K.H. Chen, T.J. Chuang, M.C. Lin, C.K. Chen, Y.F. HuangVolume:
303
Year:
1997
Language:
english
Pages:
10
DOI:
10.1016/s0040-6090(97)00041-2
File:
PDF, 952 KB
english, 1997