Structural properties of a-Si1−xNx:H films grown by plasma enhanced chemical vapour deposition by SiH4 + NH3 + H2 gas mixtures
F. Giorgis, C.F. Pirri, E. TressoVolume:
307
Year:
1997
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(97)00272-1
File:
PDF, 735 KB
english, 1997