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Preparation of TiNx thin films using r.f.–d.c. coupled magnetron sputtering in Ar–N2 gas plasma
Takeshi Tanaka, Keishi KawabataVolume:
317
Year:
1998
Language:
english
Pages:
3
DOI:
10.1016/s0040-6090(97)00605-6
File:
PDF, 107 KB
english, 1998