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Oxidation processes in hydrogenated amorphous silicon nitride films deposited by ArF laser-induced CVD at low temperatures
N Banerji, J Serra, P González, S Chiussi, E Parada, B León, M Pérez-AmorVolume:
317
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(97)00621-4
File:
PDF, 220 KB
english, 1998