Relaxation of extrinsic and intrinsic stresses in germanium substrates with silicon films
Cynthia G. Madras, Peter Y. Wong, Ioannis N. Miaoulis, Lee Goldman, Ralph KorensteinVolume:
320
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(97)00679-2
File:
PDF, 90 KB
english, 1998