Voltage controlled reactive sputtering process for...

Voltage controlled reactive sputtering process for aluminium oxide thin films

Kari Koski, Jorma Hölsä, Pierre Juliet
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Volume:
326
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(98)00546-x
File:
PDF, 120 KB
english, 1998
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