XPS and AFM study of chemical mechanical polishing of...

Thin Solid Films 1998 Vol. 333; Iss. 1-2

XPS and AFM study of chemical mechanical polishing of silicon nitride

G.-R Yang, Y.-P Zhao, Y.Z Hu, T Paul Chow, Ronald J Gutmann
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Volume:
333
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(98)00818-9
File:
PDF, 370 KB
english, 1998
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