Effect of temperature and substrate on the growth behaviors of chemical vapor deposited Al films with dimethylethylamine alane source
Tae Woong Jang, Won Moon, Jong Tae Baek, Byung Tae AhnVolume:
333
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(98)00855-4
File:
PDF, 532 KB
english, 1998