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Growth rate and microstructure of copper thin films deposited with metal-organic chemical vapor deposition from hexafluoroacetylacetonate copper(I) allyltrimethylsilane
Jong-Hoon Son, Man-Young Park, Shi-Woo RheeVolume:
335
Year:
1998
Language:
english
Pages:
8
DOI:
10.1016/s0040-6090(98)00868-2
File:
PDF, 1.01 MB
english, 1998