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Raman scattering and high resolution electron microscopy studies of metal-organic chemical vapor deposition-tungsten disulfide thin films
J-W. Chung, A. Adib, Z.R. Dai, K. Adib, F.S. OhuchiVolume:
335
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(98)00954-7
File:
PDF, 638 KB
english, 1998