![](/img/cover-not-exists.png)
Characterization of silicon oxide thin films deposited by plasma enhanced chemical vapour deposition from octamethylcyclotetrasiloxane/oxygen feeds
L. Zajı́čková, J. Janča, V. PeřinaVolume:
338
Year:
1999
Language:
english
Pages:
11
DOI:
10.1016/s0040-6090(98)00976-6
File:
PDF, 395 KB
english, 1999