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Preparation of silicon oxide films having a water-repellent layer by multiple-step microwave plasma-enhanced chemical vapor deposition
Atsushi Hozumi, Osamu TakaiVolume:
334
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(98)01116-x
File:
PDF, 82 KB
english, 1998