Rate-limiting process and growth kinetics of AlN thin films...

Rate-limiting process and growth kinetics of AlN thin films by microwave plasma CVD with AlBr3-NH3-N2 system

G.Y Meng, S Xie, D.K Peng
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Volume:
334
Year:
1998
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(98)01133-x
File:
PDF, 96 KB
english, 1998
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