Improved characterization of polycrystalline silicon film,...

Thin Solid Films 1999 Vol. 337; Iss. 1-2

Improved characterization of polycrystalline silicon film, by resonant Raman scattering

V Paillard, P Puech, P Temple-Boyer, B Caussat, E Scheid, J.P Couderc, B de Mauduit
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Volume:
337
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(98)01190-0
File:
PDF, 266 KB
english, 1999
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