Influence of substrate temperature on atomic layer growth and properties of HfO2 thin films
J Aarik, A Aidla, A.-A Kiisler, T Uustare, V SammelselgVolume:
340
Year:
1999
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(98)01356-x
File:
PDF, 452 KB
english, 1999