W- and F-doped VO2 films studied by photoelectron...

Thin Solid Films 1999 Vol. 345; Iss. 2

W- and F-doped VO2 films studied by photoelectron spectrometry

W Burkhardt, T Christmann, B.K Meyer, W Niessner, D Schalch, A Scharmann
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Volume:
345
Year:
1999
Language:
english
Pages:
7
DOI:
10.1016/s0040-6090(98)01406-0
File:
PDF, 312 KB
english, 1999
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