Correlation between the OES plasma composition and the diamond film properties during microwave PA-CVD with nitrogen addition
T Vandevelde, T.D Wu, C Quaeyhaegens, J Vlekken, M D’Olieslaeger, L StalsVolume:
340
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(98)01410-2
File:
PDF, 270 KB
english, 1999