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Copper nitride thin films prepared by reactive radio-frequency magnetron sputtering
Toshikazu Nosaka, Masaaki Yoshitake, Akio Okamoto, Soichi Ogawa, Yoshikazu NakayamaVolume:
348
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(98)01776-3
File:
PDF, 406 KB
english, 1999