Silicidation reactions with Co–Ni bilayers for low thermal budget microelectronic applications
S.K. Saha, R.S. Howell, M.K. HatalisVolume:
347
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(99)00013-9
File:
PDF, 268 KB
english, 1999