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Characteristics of self bias voltage and poly-Si etching in pulsed helicon wave plasma
Jung-Hyung Kim, Chang-Jin Kang, Tae-Hyuk Ahn, Joo-Tae MoonVolume:
345
Year:
1999
Language:
english
Pages:
6
DOI:
10.1016/s0040-6090(99)00108-x
File:
PDF, 587 KB
english, 1999