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a-SiCx:H films deposited by plasma-enhanced chemical vapor deposition at low temperature used for moisture and corrosion resistant applications
Lijun Jiang, Xiang Chen, Xuhong Wang, Liqiang Xu, Frank Stubhan, Karl-Heinz MerkelVolume:
352
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(99)00363-6
File:
PDF, 103 KB
english, 1999