Solid phase epitaxy for low pressure chemical vapor...

Thin Solid Films 1999 Vol. 353; Iss. 1-2

Solid phase epitaxy for low pressure chemical vapor deposition Si films induced by ion implantation

Peng-Shiu Chen, T.E. Hsieh, Chih-Hsun Chu
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Volume:
353
Year:
1999
Language:
english
Pages:
9
DOI:
10.1016/s0040-6090(99)00420-4
File:
PDF, 233 KB
english, 1999
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