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Electrical characterisation of thin silicon oxynitride films deposited by low pressure chemical vapour deposition
B. Hajji, P. Temple-Boyer, F. Olivié, A. MartinezVolume:
354
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(99)00650-1
File:
PDF, 97 KB
english, 1999