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Electrical and Physical Characteristics of Ba(Zr0.1Ti0.9)O3 Thin Films under Oxygen Plasma Treatment for Nonvolatile Memory Devices Application
Chen, Kai Huang, Chen, Ying Chung, Chia, Wei Kuo, Chen, Zhi Sheng, Yang, Cheng Fu, Chung, Ho HuaVolume:
368-372
Year:
2008
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.368-372.75
File:
PDF, 1.58 MB
english, 2008