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Analysis of RHEED intensities during formations of the CaF2/Si(111) and MgO/YSi2−x/Si(100) interface
Piotr Mazurek, Andrzej Daniluk, Krzysztof PaprockiVolume:
57
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0042-207x(00)00128-7
File:
PDF, 299 KB
english, 2000