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TiO2−X sputter for high rate deposition of TiO2
Yuko Tachibana, Hisashi Ohsaki, Atsushi Hayashi, Akira Mitsui, Yasuo HayashiVolume:
59
Year:
2000
Language:
english
Pages:
8
DOI:
10.1016/s0042-207x(00)00354-7
File:
PDF, 192 KB
english, 2000