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Real dimensional simulation of anisotropic etching of silicon in CF4+O2 plasma
R. Knizikevičius, A. Galdikas, A. GrigonisVolume:
66
Year:
2002
Language:
english
Pages:
9
DOI:
10.1016/s0042-207x(01)00418-3
File:
PDF, 173 KB
english, 2002