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Silicon nitride deposited by inductively coupled plasma using silane and nitrogen
Luı́s da Silva Zambom, Ronaldo Domingues Mansano, Rogério FurlanVolume:
65
Year:
2002
Language:
english
Pages:
8
DOI:
10.1016/s0042-207x(01)00476-6
File:
PDF, 186 KB
english, 2002