Response to “Comment on ‘Low level plasma formation in a carbon velvet cesium iodide coated cathode’ ” [Phys. Plasmas 11, 5730 (2004)]
Shiffler, D., Heggemeier, J., LaCour, M., Golby, K., Ruebush, M.Volume:
11
Year:
2004
Language:
english
Journal:
Physics of Plasmas
DOI:
10.1063/1.1811618
File:
PDF, 31 KB
english, 2004