Dose-dependent dynamics of nanocluster distribution in...

Vacuum 2002 Vol. 69; Iss. 1-3

Dose-dependent dynamics of nanocluster distribution in silicon implanted with Te+ and Pb+ ions: computer simulation and TEM study

P Bankov, M Kalitzova, D Karpuzov, G Zollo, G Vitali, C Pizzuto, Ch Angelov, J Faure, L Kilian
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Volume:
69
Year:
2002
Language:
english
Pages:
6
DOI:
10.1016/s0042-207x(02)00376-7
File:
PDF, 490 KB
english, 2002
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