Nanoscale lithography via electron beam induced deposition
Guan, Yingfeng, Fowlkes, Jason D, Retterer, Scott T, Simpson, Michael L, Rack, Philip DVolume:
19
Language:
english
Journal:
Nanotechnology
DOI:
10.1088/0957-4484/19/50/505302
Date:
December, 2008
File:
PDF, 593 KB
english, 2008