Methodology for Standard Cell Compliance and Detailed...

IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems 2015 / 5 Vol. 34; Iss. 5

Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography

Yu, Bei, Xu, Xiaoqing, Gao, Jhih-Rong, Lin, Yibo, Li, Zhuo, Alpert, Charles J., Pan, David Z.
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Volume:
34
Language:
english
Journal:
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
DOI:
10.1109/TCAD.2015.2401571
Date:
May, 2015
File:
PDF, 2.02 MB
english, 2015
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