Use of B2O3 films grown by plasma-assisted atomic layer...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2015 / 05 Vol. 33; Iss. 3

Use of B2O3 films grown by plasma-assisted atomic layer deposition for shallow boron doping in silicon

Kalkofen, Bodo, Amusan, Akinwumi A., Bukhari, Muhammad S. K., Garke, Bernd, Lisker, Marco, Gargouri, Hassan, Burte, Edmund P.
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4917552
Date:
May, 2015
File:
PDF, 2.50 MB
english, 2015
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