Characteristics of WNxCy films deposited using remote...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2015 / 09 Vol. 33; Iss. 5

Characteristics of WNxCy films deposited using remote plasma atomic layer deposition with (MeCp)W(CO)2(NO) for Cu diffusion barrier

Kim, Hyunjung, Park, Jingyu, Jeon, Heeyoung, Jang, Woochool, Jeon, Hyeongtag, Yuh, Junhan
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4922936
Date:
September, 2015
File:
PDF, 975 KB
english, 2015
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