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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Diffusion effects in chemically amplified deep-UV resists
Zuniga, Marco A., Tomacruz, Eric, Neureuther, Andrew R., Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175349
File:
PDF, 342 KB
english, 1994