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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - Toward 10nm half-pitch in EUV lithography: results on resist screening and pattern collapse mitigation techniques
Wood, Obert R., Panning, Eric M., Kulmala, Tero S., Vockenhuber, Michaela, Buitrago, Elizabeth, Fallica, Roberto, Ekinci, YasinVolume:
9422
Year:
2015
Language:
english
DOI:
10.1117/12.2085936
File:
PDF, 984 KB
english, 2015