Generation of Dislocations Induced by Chemical Vapor...

Japanese Journal of Applied Physics 1972 / 8 Vol. 11; Iss. 8

Generation of Dislocations Induced by Chemical Vapor Deposited Si 3 N 4 Films on Silicon

Tamura, Masao, Sunami, Hideo
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Volume:
11
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.11.1097
Date:
August, 1972
File:
PDF, 2.87 MB
1972
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