Si Quantum Dot Formation with Low-Pressure Chemical Vapor...

Japanese Journal of Applied Physics 1996 / 2 Vol. 35; Iss. Part 2, No

Si Quantum Dot Formation with Low-Pressure Chemical Vapor Deposition

Nakajima, Anri, Sugita, Yoshihiro, Kawamura, Kazuo, Tomita, Hirofumi, Yokoyama, Naoki
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Volume:
35
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.35.L189
Date:
February, 1996
File:
PDF, 952 KB
1996
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