Feasibility Study of Chemically Amplified Extreme...

Japanese Journal of Applied Physics 2008 / 6 Vol. 47; Iss. 6

Feasibility Study of Chemically Amplified Extreme Ultraviolet Resists for 22 nm Fabrication

Kozawa, Takahiro, Tagawa, Seiichi, Santillan, Julius Joseph, Toriumi, Minoru, Itani, Toshiro
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Volume:
47
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.47.4465
Date:
June, 2008
File:
PDF, 144 KB
english, 2008
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