Fabrication of High-Sensitivity Polycrystalline Silicon...

Japanese Journal of Applied Physics 2011 / 4 Vol. 50; Iss. 4

Fabrication of High-Sensitivity Polycrystalline Silicon Nanowire Field-Effect Transistor pH Sensor Using Conventional Complementary Metal–Oxide–Semiconductor Technology

Chen, Hou-Yu, Lin, Chia-Yi, Chen, Min-Cheng, Huang, Chien-Chao, Chien, Chao-Hsin
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Volume:
50
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.50.04DL05
Date:
April, 2011
File:
PDF, 1.01 MB
english, 2011
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