Phenomenon of resist debris formation in electron beam...

Vacuum 1996 Vol. 47; Iss. 11

Phenomenon of resist debris formation in electron beam lithography and its possible application

PR Deshmukh, KJ Rangra, M Singh, PD Vyas, BB Pal
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Volume:
47
Year:
1996
Language:
english
Pages:
7
DOI:
10.1016/s0042-207x(96)00206-0
File:
PDF, 852 KB
english, 1996
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