Magnetically enhanced inductively coupled plasma CVD for...

Magnetically enhanced inductively coupled plasma CVD for a-Si:H fabrication

M Murata, Y Takeuchi, S Nishida
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Volume:
48
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0042-207x(96)00241-2
File:
PDF, 539 KB
english, 1997
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