Control of high-density plasma sources for CVD and etching
K Suzuki, H Sugai, K Nakamura, TH Ahn, M NagatsuVolume:
48
Year:
1997
Language:
english
Pages:
6
DOI:
10.1016/s0042-207x(97)00054-7
File:
PDF, 734 KB
english, 1997