SiO2 film growth at room temperature by plasma enhanced evaporation in an UHV chamber
A Strass, W Hansch, A Neubecker, P Bieringer, A Fischer, I EiseleVolume:
48
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0042-207x(97)00059-6
File:
PDF, 365 KB
english, 1997