Monte Carlo simulation of argon atoms transport during deposition of W thin films by RF-dc coupled magnetron sputtering
PK Petrov, VA Volpyas, EK Hollmann, T Tanaka, K KawabataVolume:
48
Year:
1997
Language:
english
Pages:
2
DOI:
10.1016/s0042-207x(97)00079-1
File:
PDF, 205 KB
english, 1997