Selective deposition of amorphous hydrogenated carbon films...

Vacuum 1999 Vol. 52; Iss. 3

Selective deposition of amorphous hydrogenated carbon films used as masks for reactive ion etching of Si using CF4

Marco AR Alves, Olga Balachova, Edmundo da Silva Braga, Lucila Cescato
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Volume:
52
Year:
1999
Language:
english
Pages:
2
DOI:
10.1016/s0042-207x(98)00305-4
File:
PDF, 229 KB
english, 1999
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