Application of CCl2F2- and CCl4-based plasmas for RIE of...

Vacuum 2000 Vol. 56; Iss. 1

Application of CCl2F2- and CCl4-based plasmas for RIE of GaSb and related materials

A Piotrowska, E Kamińska, T.T Piotrowski, M Guziewicz, K Golaszewska, E Papis, J Wróbel, L Perchuć
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Volume:
56
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0042-207x(99)00166-9
File:
PDF, 408 KB
english, 2000
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