Characterisation of ZrO2 films prepared by rf reactive sputtering at different O2 concentrations in the sputtering gases
Pengtao Gao, L.J Meng, M.P dos Santos, V Teixeira, M AndritschkyVolume:
56
Year:
2000
Language:
english
Pages:
6
DOI:
10.1016/s0042-207x(99)00199-2
File:
PDF, 248 KB
english, 2000